Paramagnetic defects in ultrafine silicon particles

Journal of Applied Physics

Volumn 91, Issue 2, 2002, Pages 815-818

  Dohi, Minoru ^a   Yamatani, Hiroshi ^a   Fujita, Tetsuo ^a  

^a SHIZUOKA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

G-VALUES; GAS EVAPORATION; IN-VACUUM; INFRARED SPECTRUM; MICROWAVE POWER; PARAMAGNETIC DEFECTS; ROOM TEMPERATURE; SI-PARTICLE; SILICON PARTICLES; SURFACE OXIDE LAYER; ULTRAFINE;

PARAMAGNETISM; SILICON;

SURFACE DEFECTS;

EID: 0037080876     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1425436     Document Type: Article

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