Current status of next generation EUVL mask blank tool development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 1287-1296

  Ma, Andy ^a   Kemp, Kevin ^a   Randive, Rajul ^b   Weaver, Al ^b   Roberti, Mark ^b   Hayes, Alan ^b   Abraham, Dan ^b   Mirkarimi, Paul ^c   Spiller, Eberhard ^c   Kearney, Patrick ^c  

^a SEMATECH   (United States)

^b VEECO INSTRUMENTS INC   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Ion beam deposition; Multilayer deposition; Reflectivity

Indexed keywords

FABRICATION; ION BEAM ASSISTED DEPOSITION; LIGHT REFLECTION; MEASUREMENTS; MOLYBDENUM; MULTILAYERS; PHOTOLITHOGRAPHY; POLISHING; SILICON; SPUTTER DEPOSITION;

EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL); MULTILAYER DEPOSITION;

MASKS;

EID: 11144355606     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535866     Document Type: Conference Paper

References (6)

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