Nano-crystalline Si1 - xCx:H thin films deposited by PECVD for SiC-on-insulator application

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 119-122

  Forhan, N A E ^a   Fantini, M C A ^a   Pereyra, I ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON ON INSULATOR TECHNOLOGY; THERMAL CONDUCTIVITY; X RAY DIFFRACTION;

FILM DEPOSITION; HIGH-FREQUENCY DEVICES; RADIATION RANGES; SMART SENSORS;

THIN FILMS;

EID: 2942585290     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.02.034     Document Type: Conference Paper

References (7)

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