Study and control of the interfacial mass transfer of resist components in 193nm immersion lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 40-51

  Kanna, Shinichi ^a   Inabe, Haruki ^a   Yamamoto, Kei ^a   Tarutani, Shinji ^a   Kanda, Hiromi ^a   Mizutani, Kazuyoshi ^a   Kitada, Kazuyuki ^a   Uno, Seiji ^a   Kawabe, Yasumasa ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

Immersion lithography; Leaching; Mass transfer; Non topcoat; Topcoat

Indexed keywords

DIFFUSION; LEACHING; MASS TRANSFER; ORGANIC ACIDS; PHOTOLITHOGRAPHY; SOLUBILITY; SURFACES;

IMMERSION LITHOGRAPHY; INTERFACIAL MASS TRANSFER; NON-TOPCOAT; TOPCOAT RESISTS;

PHOTORESISTS;

EID: 24644478508     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600490     Document Type: Conference Paper

References (7)

1. S.Kanna et al., Presentation at the Intl. Sematech Symposium on Immersion & 157nm Lithography Workshop, Aug (2004)
2. W.Hinsberg et al., "Liquid Immersion lithography: evaluation of resist issues," Proc. SPIE, 5376, 21 (2004).
3. S.Kishimura et al., "Resist interaction in 193/157-nm immersion lithography," Proc. SPIE, 5376, 44 (2004).
4. B.D.Vogt et at., "Measurement of water distribution in thin lithographic films," Proc. SPIE, 5376, 56 (2004)
5. Ralgh R. Dammel et al., " 193nm Immersion Lithography-Taking the Plunge," J. Photopolym. Sci. Technol., 17, 4, 587 (2004).
6. M. Yoshida et al., "Development Status of High Performance Materials for Immersion Lithography," J. Photopolym. Sci. Technol., 17, 4, 603 (2004).
7. rd.Ed. "Reinhold Publishing Co., NewYork(1950)