Novel non-ionic photoacid generator releasing strong acid for chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 103-114

  Yamato, Hitoshi ^a   Asakura, Toshikage ^a   Hintermann, Tobias ^a   Ohwa, Masaki ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

ArF; Chemically amplified resists; Non ionic; Photoacid generator; Strong acid

Indexed keywords

LIGHT ABSORPTION; MASKS; ORGANIC ACIDS; SOLUBILITY; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS; NON IONIC PHOTOACID GENERATORS; PHOTOEFFICIENCY;

PHOTORESISTS;

EID: 3843106812     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.531803     Document Type: Conference Paper

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