Transparency vs. Efficiency in 193nm photoacid generator design

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 178-190

  Pohlers, Gerd ^a   Suzuki, Yasuhiro ^a   Chan, Nicholas ^a   Cameron, James F ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

Acid generating efficiency; C parameter; Deep UV and 193 nm chemically amplified resists; P parameter; Photoacid generator; Quantum yield

Indexed keywords

ACIDS; EFFICIENCY; SALTS; TRANSPARENCY;

PHOTOACID GENERATORS (PAG); PHOTOEFFICIENCY;

LITHOGRAPHY;

EID: 0036028589     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474217     Document Type: Article

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