Novel photoacid generators for chemically amplified resists

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 799-808

  Yamato, Hitoshi ^a   Asakura, Toshikage ^a   Matsumoto, Akira ^a   Ohwa, Masaki ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

Chemically amplified resists; DUV; Non ionic; PAG; Stability

Indexed keywords

ACTIVATION ENERGY; DISSOLUTION; FABRICATION; LIGHT ABSORPTION; SEMICONDUCTOR DEVICE MANUFACTURE; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION;

PHOTOACID GENERATORS (PAG);

PHOTORESISTS;

EID: 0036028911     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474281     Document Type: Article

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