Evaluation of a novel photoacid generator for chemically amplified photoresist with ArF exposure

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 140-148

  Asakura, Toshikage ^a   Yamato, Hitoshi ^a   Hintermann, Tobias ^a   Ohwa, Masaki ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

ArF; Chemically amplified resist; Non ionic; Photoacid generator; Strong acid

Indexed keywords

LASER BEAM EFFECTS; LEACHING; MATHEMATICAL MODELS; ORGANIC ACIDS; SOLUBILITY;

ARF; CHEMICALLY AMPLIFIED RESISTS (CAR); NON-IONIC; PHOTOACID GENERATORS; STRONG ACID;

PHOTORESISTS;

EID: 24644520977     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600327     Document Type: Conference Paper

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