Application of PVD silver for integrated microwave passives in silicon technology

Solid-State Electronics

Volumn 50, Issue 7-8, 2006, Pages 1389-1394

  Levenets, V V ^a   Amaya, R E ^a   Tarr, N G ^a   Smy, T J ^a  

^a CARLETON UNIVERSITY   (Canada)

Author keywords

Coplanar waveguides; Copper; Electroplating; Gold; Losses; Microwave technology; Monolithic microwave integrated circuits; Physical vapor deposition; Semiconductor device fabrication; Silicon; Silver; Transmission lines

Indexed keywords

COPPER COMPOUNDS; ELECTRIC LINES; ELECTROPLATING; GOLD; MICROWAVES; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; SILVER; WAVEGUIDES;

INTEGRATED MICROWAVE PASSIVES; MICROWAVE TECHNOLOGY; SEMICONDUCTOR DEVICE FABRICATION; SILICON TECHNOLOGY;

PHYSICAL VAPOR DEPOSITION;

EID: 33747202169     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2006.06.014     Document Type: Article

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