Post-processed Cu inductors with application to a completely integrated 2-GHz VCO

IEEE Transactions on Electron Devices

Volumn 48, Issue 6, 2001, Pages 1284-1287

  Rogers, J W M ^a   Levenets, V ^a   Pawlowicz, C A ^a   Tarr, N G ^a   Smy, T J ^a   Plett, C ^a  

^a CARLETON UNIVERSITY   (Canada)

Author keywords

Bipolar transistor circuits; Copper interconnect; Inductors; Phase noise; Polyimide films; Voltage controlled oscillator (VCO)

Indexed keywords

BIPOLAR TRANSISTORS; COPPER; DIELECTRIC MATERIALS; MONOLITHIC INTEGRATED CIRCUITS; SUBSTRATES; VARIABLE FREQUENCY OSCILLATORS;

PHASE NOISE;

ELECTRIC INDUCTORS;

EID: 0035367202     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.925264     Document Type: Article

References (8)

1. A high Q on-chip Cu inductor post process for Si integrated circuits
2. The effect of varactor nonlinearity on the phase noise of completely integrated VCOs
3. A simple model of feedback oscillator noise spectrum
4. Analysis, design, and optimization of spiral inductors and transformers for Si RF ICs
5. Simulation of electroless deposition of Cu thin films for very large scale integration metallization
6. A fully integrated spiral-LC CMOS VCO with prescaler for GSM and DCS-1800 systems
7. The effect of varactor non-linearity on the phase noise of a completely integrated 1.8 GHz VCO