Characterizing high-k and low-k dielectric materials for semiconductors: Progress and challenges

Applied Surface Science

Volumn 252, Issue 19, 2006, Pages 7167-7171

  Bennett, J ^a   Quevedo Lopez, M ^b   Satyanarayana, S ^b  

^a ATDF   (United States)

^b SEMATECH   (United States)

Author keywords

Depth profiling; Dopant quantification; High k; Low k; Preferential sputtering

Indexed keywords

DEPOSITION; DIELECTRIC MATERIALS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SPUTTERING; THIN FILMS;

DEPTH PROFILING; DOPANT QUANTIFICATION; HIGH-K; LOW-K; PREFERENTIAL SPUTTERING;

SEMICONDUCTOR MATERIALS;

EID: 33747154142     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.087     Document Type: Article

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