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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1134-1138

Comparative ion yields by secondary ion mass spectrometry from microelectronic films

(1) Parks, C C a

a IBM (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIAPHRAGMS; ION IMPLANTATION; ISOTOPES; MICROELECTRONICS; SECONDARY ION MASS SPECTROMETRY; SPUTTERING;

MICROELECTRONIC FILMS;

SEMICONDUCTING FILMS;

EID: 0035393850 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1361037 Document Type: Article

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.