Thermal stability of amorphous LaScO 3 films on silicon

Applied Physics Letters

Volumn 89, Issue 6, 2006, Pages

  Edge, L F ^a   Schlom, D G ^a   Rivillon, S ^b   Chabal, Y J ^b   Agustin, M P ^c   Stemmer, S ^c   Lee, T ^d   Kim, M J ^d   Craft, H S ^e   Maria, J P ^e   Hawley, M E ^f   Hollander B ^g   Schubert, J ^g   Eisenbeiser, K ^h  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b RUTGERS UNIVERSITY   (United States)

^c University of California   (United States)

^d The University of Texas at Dallas   (United States)

^e North Carolina State University   (United States)

^f LOS ALAMOS NATIONAL LABORATORY   (United States)

^g FORSCHUNGSZENTRUM JÜLICH   (Germany)

^h MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INFRARED ABSORPTION SPECTROSCOPY (IRAS); INTERLAYERS; MOLECULAR BEAM DEPOSITION;

AMORPHOUS MATERIALS; HIGH RESOLUTION ELECTRON MICROSCOPY; LANTHANUM COMPOUNDS; MOLECULAR BEAMS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION;

THIN FILMS;

EID: 33747121612     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2222302     Document Type: Article

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