Preparation of carbon nitride films by DC arc plasma jet CVD

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 917-920

  Yamazato, M ^a   Higa, A ^a   Oshiro, T ^a   Toyama, H ^a   Maehama, T ^a   Toguchi, M ^a  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

Author keywords

Bonding configurations; Carbon nitride; Chemical vapor deposition; Hardness

Indexed keywords

CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; DC MOTORS; ELECTRIC ARCS; GRAPHITE; HARDNESS; PLASMA JETS; SILICON; SUBSTRATES;

BONDING CONFIGURATIONS; CARBON SOURCE; DC ARC PLASMA JET CVD; NITROGEN SOURCES;

THIN FILMS;

EID: 33747004658     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.12.030     Document Type: Article

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