Finding a promising precursor for chemical vapor deposition of carbon nitride thin films

Thin Solid Films

Volumn 464-465, Issue , 2004, Pages 170-174

  Uddin, Md Nizam ^a   Notomi, Hirofumi ^a   Kida, Tetsuya ^a   Yamazato, Masaaki ^a   Nagano, Masamitsu ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition (CVD); Nitrides; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

CARBON NITRIDE; CRYSTAL STRUCTURE; DEPOSITION; ELASTIC MODULI; FILM GROWTH; HARDNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PYROMETERS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

BONDING STRUCTURES; OPTICAL PYROMETERS; STAINLESS STEEL FLANGES;

THIN FILMS;

EID: 4544315731     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.076     Document Type: Article

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