Production of stable ion beam of Os3(CO)12 with compact metal-cluster-complex ion source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 7, 2006, Pages 6000-6007

  Fujiwara, Yukio ^a   Kondou, Kouji ^a   Teranishi, Yoshikazu ^a   Nonaka, Hidehiko ^a   Fujimoto, Toshiyuki ^a   Kurokawa, Akira ^a   Ichimura, Shingo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Ion beam; Metal cluster complex; OS3(CO)12; SIMS; Sputtering

Indexed keywords

COMPLEXATION; ION SOURCES; OSMIUM COMPOUNDS; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; TEMPERATURE CONTROL;

BEAM TARGET; HEAT-REMOVAL DEVICES; METAL CLUSTER COMPLEX; OS3(CO)12;

ION BEAMS;

EID: 33746781311     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.6000     Document Type: Article

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