Application of metal cluster complex ion beam for low damage sputtering

Surface and Interface Analysis

Volumn 37, Issue 2, 2005, Pages 164-166

  Fujimoto, Toshiyuki ^a   Mizota, Takeshi ^a   Nonaka, Hidehiko ^a   Kurokawa, Akira ^a   Ichimura, Shingo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Cluster ion bean; Low damage sputtering; Metal cluster complex

Indexed keywords

CARBON; ION BEAMS; IONIZATION; JETS; MASS SPECTROMETRY; NOZZLES; SHEET METAL; SPUTTERING;

CLUSTER ION BEAM; LOW DAMAGE SPUTTERING; METAL CLUSTER COMPLEX;

COMPLEXATION;

EID: 13244249779     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1955     Document Type: Conference Paper

References (3)

1. International Technology Roadmap for Semiconductors 2001. Semiconductor Industry Association: 2001.
2. Yamada I, Matsuo J, Toyoda N. Nucl. Instrum. Methods B 2003; 206: 820.
3. Mizota T, Nonaka H, Fujimoto T, Kurokawa A, Ichimura S. Proc. 14th Int. Conf. on Secondary Ion Mass Spectrometry (SIMS XIV), San Diego, 2003.