Production of Liquid Cluster Ions for Surface Treatment

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 8 B, 2003, Pages

  Takaoka, Gikan H ^a   Noguchi, Hidetaka ^a   Yamamoto, Tomoaki ^a   Seki, Toshio ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Cluster ion beam; Ethanol; Liquid cluster; Silicon; Surface etching

Indexed keywords

CHEMICAL MODIFICATION; ETHANOL; ION BEAMS; IONIZATION; NOZZLES; SILICON; SPUTTERING; VAPORS;

LIQUID CLUSTER IONS;

ETCHING;

EID: 0142095123     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l1032     Document Type: Article

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