Structure and optical properties of the SiC/ZnO five-layer multi-layer on Si (III) substrate with a SiC buffer layer

Journal of Physics D: Applied Physics

Volumn 39, Issue 15, 2006, Pages 3240-3243

  Sha, Z D ^a   Yan, Y ^a   Qin, W X ^a   Wu, X M ^a   Zhuge, L J ^a  

^a SOOCHOW UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BAND STRUCTURE; DEPOSITION; MAGNETRON SPUTTERING; SILICON CARBIDE; ZINC;

BUFFER LAYERS; DEPLETION REGIONS; LATTICE DEFORMATION; REDSHIFT;

MULTILAYERS;

EID: 33746404208     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/15/005     Document Type: Article

References (20)

1. Mönch W 2005 Appl. Phys. Lett. 86 162101
2. Ashrafi A B M A, Segawa Y, Shin K and Yao T 2005 Phys. Rev. B 72 155302
3. Feng Z C, Chua S J, Tone K and Zhao J H 1999 Appl. Phys. Lett. 75 472
4. Fan J Y, Wu X L, Kong F, Qiu T and Huang G S 2005 Appl. Phys. Lett. 86 171903-1
5. Henry A, Janson M S and Janzén E 2003 Physica B 340-342 141
6. Sha Z D, Wang J, Chen Z C, Chen A J, Zhou Z Y, Wu X M and Zhuge L J 2006 Physica E 33 263
7. Sha Z D, Wu X M and Zhuge L J 2006 Phys. Lett. A 355 228
8. Fang Z B, Wang Y Y, Peng X P, Liu X Q and Zhen C M 2003 Mater. Lett. 57 4187
9. Zhuge L J, Wu X M, Li Q, Wang W B and Xiang S L 2004 Physica E 23 86
10. Dashiell M W, Kulik L V, Hits D and Kolodzey J 1998 Appl. Phys. Lett. 72 833
11. Sha Z D, Wu X M and Zhuge L J 2005 Vacuum 79 250
12. Sha Z D, Wu X M and Zhuge L J 2005 Phys. Lett. A 346 186
13. Zhu J J, Lin B X, Sun X K, Yao R, Shi C S and Fu Z X 2005 Thin Solid Films 478 218
14. Sun Y and Miyasato T 1998 Japan. J. Appl. Phys. 37 5485
15. Ashrafi A B M A, Segawa Y, Shin K and Yao T 2005 Phys. Rev. B 72 155302
16. Rainho J P, Rocha J, Carlos L D and Almeida R M 2001 J. Mater. Res. 16 2369
17. Ehrman S H, Friedlander S K and Zachariah M R 1999 J. Mater. Res. 14 4551
18. Cho S, Ma J, Kim Y, Sun Y, Wang G K L and Ketterson J B 1999 Appl. Phys. Lett. 75 2761
19. Chen Y, Bagnall D M, Koh H J, Park K T, Hiraga K, Zhu Z and Yao T 1998 J. Appl. Phys. 84 3912
20. Jin B J, Im S and Lee S Y 2000 Thin Solid Films 366 107