-
1
-
-
33750298375
-
Trends and prospects in SiP technology and three dimensional packaging technology
-
Bonkohara M, Takahashi K, Ishino M. Trends and prospects in SiP technology and three dimensional packaging technology. Trans IEICE 2004;J87-C:791-801.
-
(2004)
Trans IEICE
, vol.J87-C
, pp. 791-801
-
-
Bonkohara, M.1
Takahashi, K.2
Ishino, M.3
-
2
-
-
28044443282
-
The dawn of 3D packaging as system-in-package (SIP)
-
Kada M. The dawn of 3D packaging as system-in-package (SIP).IEICE Trans Electron 2001;E84-C:1763-1770.
-
(2001)
IEICE Trans Electron
, vol.E84-C
, pp. 1763-1770
-
-
Kada, M.1
-
3
-
-
33746165109
-
Packaging technology trends and challenges for system-in-package
-
Dohya A. Packaging technology trends and challenges for system-in-package. IEICE Trans Electron 2001;E84-C:1756-1762.
-
(2001)
IEICE Trans Electron
, vol.E84-C
, pp. 1756-1762
-
-
Dohya, A.1
-
4
-
-
3142614052
-
Biologically inspired vision chip with three dimensional structure
-
Kurino H, Nakagawa Y, Nakamura T, Yamada Y, Lee KW, Koyanagi M. Biologically inspired vision chip with three dimensional structure. IEICE Trans Electron 2001;E84-C:1717-1722.
-
(2001)
IEICE Trans Electron
, vol.E84-C
, pp. 1717-1722
-
-
Kurino, H.1
Nakagawa, Y.2
Nakamura, T.3
Yamada, Y.4
Lee, K.W.5
Koyanagi, M.6
-
5
-
-
3142539017
-
Micro Cu bump interconnection on 3D chip stacking technology
-
Tanida K, Umemoto M, Tanaka N, Tomita Y, Takahashi K. Micro Cu bump interconnection on 3D chip stacking technology. Jpn J Appl Phys 2004;43:2264-2270.
-
(2004)
Jpn J Appl Phys
, vol.43
, pp. 2264-2270
-
-
Tanida, K.1
Umemoto, M.2
Tanaka, N.3
Tomita, Y.4
Takahashi, K.5
-
6
-
-
0037672003
-
Au bump interconnection with ultrasonic flip-chip bonding in 20 μm pitch
-
Tanida K, Umemoto M, Tomita Y, Tago M, Kajiwara R, Akiyama Y, Takahashi K. Au bump interconnection with ultrasonic flip-chip bonding in 20 μm pitch. Jpn J Appl Phys 1 Regul Pap 2003;42:2198-2203.
-
(2003)
Jpn J Appl Phys 1 Regul Pap
, vol.42
, pp. 2198-2203
-
-
Tanida, K.1
Umemoto, M.2
Tomita, Y.3
Tago, M.4
Kajiwara, R.5
Akiyama, Y.6
Takahashi, K.7
-
7
-
-
0037672007
-
Behavior of plated microbumps during ultrasonic flip-chip bonding determined from dynamic strain measurement
-
Watanabe N, Asano T. Behavior of plated microbumps during ultrasonic flip-chip bonding determined from dynamic strain measurement. Jpn J Appl Phys 1 Regul Pap 2003;42:511-517.
-
(2003)
Jpn J Appl Phys 1 Regul Pap
, vol.42
, pp. 511-517
-
-
Watanabe, N.1
Asano, T.2
-
8
-
-
33846693940
-
Piezoresistance effect in silicon and germanium
-
Smith CS. Piezoresistance effect in silicon and germanium. Phys Rev 1954;94:42-49.
-
(1954)
Phys Rev
, vol.94
, pp. 42-49
-
-
Smith, C.S.1
-
9
-
-
0019916789
-
A graphical representation of the piezoresistive coefficients in silicon
-
Kanda Y. A graphical representation of the piezoresistive coefficients in silicon. IEEE Trans Electron Devices 1982;29:64-70.
-
(1982)
IEEE Trans Electron Devices
, vol.29
, pp. 64-70
-
-
Kanda, Y.1
-
11
-
-
0027553244
-
Thermal stress measurement in silicon chips encapsulated in IC plastic packages under thermal cycling
-
Miura H, Kitano M, Nishimura A, Kawai S. Thermal stress measurement in silicon chips encapsulated in IC plastic packages under thermal cycling. J Electron Packag 1993;115:9-15.
-
(1993)
J Electron Packag
, vol.115
, pp. 9-15
-
-
Miura, H.1
Kitano, M.2
Nishimura, A.3
Kawai, S.4
-
12
-
-
0028735472
-
Device characteristic changes caused by packaging stress
-
Miura H, Nishimura A. Device characteristic changes caused by packaging stress. ASME, Mechanics and Materials for Electronic Packaging, Vol. AMD-195, p 101-109, 1994.
-
(1994)
ASME, Mechanics and Materials for Electronic Packaging
, vol.AMD-195
, pp. 101-109
-
-
Miura, H.1
Nishimura, A.2
-
13
-
-
0001038893
-
Band structure deformation potentials, and carrier mobility in strained Si, Ge, and SiGe alloys
-
Fischetti MV, Laux SE. Band structure deformation potentials, and carrier mobility in strained Si, Ge, and SiGe alloys. J Appl Phys 1996;80:2234-2252.
-
(1996)
J Appl Phys
, vol.80
, pp. 2234-2252
-
-
Fischetti, M.V.1
Laux, S.E.2
-
14
-
-
0002647466
-
Silicon piezoresistive stress sensors and their application in electronic packaging
-
Suhling JC, Jaeger RC. Silicon piezoresistive stress sensors and their application in electronic packaging. IEEE Sensors J 2001;1:14-30.
-
(2001)
IEEE Sensors J
, vol.1
, pp. 14-30
-
-
Suhling, J.C.1
Jaeger, R.C.2
-
15
-
-
32844468320
-
Stress-optimization of a thin-film semiconductor
-
Tsuchiura
-
Kumagai Y, Ohta H, Miura H, Shimizu A. Stress-optimization of a thin-film semiconductor. Proc Int Symposium on Micro-Mechanical Engineering, p 427-432, Tsuchiura, 2003.
-
(2003)
Proc Int Symposium on Micro-Mechanical Engineering
, pp. 427-432
-
-
Kumagai, Y.1
Ohta, H.2
Miura, H.3
Shimizu, A.4
-
16
-
-
0019545856
-
Stress-sensitive properties of silicon-gate MOS devices
-
Mikoshiba H. Stress-sensitive properties of silicon-gate MOS devices. Solid-State Electron 1981;24: 221-232.
-
(1981)
Solid-State Electron
, vol.24
, pp. 221-232
-
-
Mikoshiba, H.1
-
18
-
-
0033690681
-
Designing of silicon effective quantum dots by using the oxidation-induced strain: A theoretical approach
-
Shiraishi K, Nagase M, Horiguchi S, Kageshima H, Uematsu M, Takahashi Y, Murase K. Designing of silicon effective quantum dots by using the oxidation-induced strain: A theoretical approach. Physica E 2000;7:337-341.
-
(2000)
Physica E
, vol.7
, pp. 337-341
-
-
Shiraishi, K.1
Nagase, M.2
Horiguchi, S.3
Kageshima, H.4
Uematsu, M.5
Takahashi, Y.6
Murase, K.7
-
19
-
-
0036767903
-
Evaluation of MOS devices as mechanical stress sensors
-
Chen TS, Huang YR. Evaluation of MOS devices as mechanical stress sensors. IEEE Trans Compon Packag Technol 2002;25:2193-2197.
-
(2002)
IEEE Trans Compon Packag Technol
, vol.25
, pp. 2193-2197
-
-
Chen, T.S.1
Huang, Y.R.2
-
20
-
-
33846693940
-
Piezoresistance effect in germanium and silicon
-
Smith CS. Piezoresistance effect in germanium and silicon. Phys Rev 1954;94:42-49.
-
(1954)
Phys Rev
, vol.94
, pp. 42-49
-
-
Smith, C.S.1
-
21
-
-
0000863124
-
Mobility anisotropy and piezoresistance in silicon P-type inversion layers
-
Colman D, Bate RT, Mize JP. Mobility anisotropy and piezoresistance in silicon P-type inversion layers. J Appl Phys 1968;39:1923-1931.
-
(1968)
J Appl Phys
, vol.39
, pp. 1923-1931
-
-
Colman, D.1
Bate, R.T.2
Mize, J.P.3
|