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Volumn 91, Issue 2, 2002, Pages 686-689

Atomistic simulations of structural relaxation processes in amorphous silicon

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON (A-SI); ATOMISTIC SIMULATIONS; BOND-ANGLE DISTRIBUTION; EXPERIMENTAL MEASUREMENTS; INTERATOMIC POTENTIAL; MD SIMULATION; MOLECULAR DYNAMICS SIMULATIONS; PHONON DENSITY; RADIAL DISTRIBUTION FUNCTIONS; STATIC STRUCTURE FACTORS; STRUCTURAL CHANGE;

EID: 0037080739     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1425437     Document Type: Article
Times cited : (43)

References (38)
  • 28
    • 0001097625 scopus 로고    scopus 로고
    • experimental>300K. [Note that they assumed that the melting point of c-Si generated by the Tersoff potential is 3000 K, slightly higher than the one estimated by Cook and Clancy (2547±22K) (Ref. 23)].
    • (1999) Phys. Rev. B , vol.60 , pp. 12610
  • 31
    • 0004363891 scopus 로고
    • edited by M. A. Kastner, G. A. Thomas, and S. R. Ovshinsky (Plenum, New York)
    • R. Tsu, in Disordered Semiconductors, edited by M. A. Kastner, G. A. Thomas, and S. R. Ovshinsky (Plenum, New York, 1987), p. 479.
    • (1987) Disordered Semiconductors , pp. 479
    • Tsu, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.