Polycrystalline silicon formation by pulsed rapid thermal annealing of amorphous silicon

Applied Physics Letters

Volumn 69, Issue 8, 1996, Pages 1092-1094

  Kuo, Yue ^a   Kozlowski, P M ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001445327     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117068     Document Type: Article

References (14)

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