From optical proximity correction to lithography-driven physical design (1996-2006): 10 years of resolution enhancement technology and the roadmap enablers for the next decade

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Capodieci, Luigi ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

Design For Manufacturing; Design Regularity; Design Rule Manual; Layout Printability Verification; Optical Proximity Correction; Pattern Matching; Resolution Enhancement Techniques; Yield Optimization

Indexed keywords

MASKS; OPTIMIZATION; PATTERN MATCHING; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

DESIGN FOR MANUFACTURING; DESIGN REGULARITY; DESIGN RULE MANUAL; LAYOUT PRINTABILITY VERIFICATION; OPTICAL PROXIMITY CORRECTION; RESOLUTION ENHANCEMENT TECHNIQUES; YIELD OPTIMIZATION;

OPTICAL VARIABLES CONTROL;

EID: 33745773693     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.663289     Document Type: Conference Paper

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