Impact of RET on physical layouts

Proceedings of the International Symposium on Physical Design

Volumn , Issue , 2001, Pages 52-55

  Schellenberg, F M ^a   Capodieci, L ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

DFM; Lithography; Off axis illumination; OPC; Phase shifting; Physical verification; PSM; RET; Simulation

Indexed keywords

COMPUTER SIMULATION; MASKS; OPTICAL RESOLVING POWER; PHASE SHIFT;

RESOLUTION ENHANCEMENT TECHNOLOGIES (RET);

LITHOGRAPHY;

EID: 0034831414     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/369691.369731     Document Type: Conference Paper

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