Advanced DFM applications using design based metrology on CD SEM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Lorusso, G F ^a,c   Capodieci, L ^b   Stoler, D ^a   Schulz, B ^b   Roling, S ^b   Schramm, J ^d   Tabery, C ^b   Shah, K ^b   Singh, B ^b   Abbott, G ^a   Roberts, A ^d   Azordegan, A ^a   Heinrichs, L ^d   Kaliblotzky, Z ^a   Castel, E ^a  

^a KLA TENCOR CORPORATION   (United States)

^b ADVANCED MICRO DEVICES   (United States)

^c IMEC ^*  (Belgium)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMATION FLOW; DESIGN BASED METROLOGY (DBM); DESIGN FOR MANUFACTURABILITY (DFM); LINE-EDGE-ROUGHNESS (LER);

ALGORITHMS; AUTOMATION; FLOW CONTROL; PATTERN RECOGNITION; PRODUCT DESIGN; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

MEASUREMENT THEORY;

EID: 33745622823     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.674776     Document Type: Conference Paper

References (1)

1. Eric Solecky Kay Chin, Gongyuan Qu, Hedong Yang, Gian Lorusso, and Amir Azordegan Automated CD SEM tilt-ready for primetime: a fast in-line methodology for differentiating lines vs. spaces Proceedings of SPIE - Volume 5752 Metrology, Inspection, and Process Control for Microlithography XIX, Richard M. Silver, Editor, May 2005, pp. 351-362