Evaluation of OPC quality using automated edge placement error measurement with CD-SEM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Tabery, Cyrus ^a   Morokuma, Hidetoshi ^b   Sugiyama, Akiyuki ^b   Page, Lorena ^c  

^a ADVANCED MICRO DEVICES   (United States)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^c Hitachi High Technologies America   (United States)

Author keywords

CD SEM; Dense SEM calibration; Design based metrology; Die to design inspection; Edge placement error; Empirical PVBAND; OPC

Indexed keywords

CD-SEM; DENSE SEM CALIBRATION; DESIGN BASED METROLOGY; DIE-TO-DESIGN INSPECTION; EDGE PLACEMENT ERROR; EMPIRICAL PVBAND;

ERROR ANALYSIS; IMAGE QUALITY; LITHOGRAPHY; MATHEMATICAL MODELS; PATTERN MATCHING; SCANNING ELECTRON MICROSCOPY;

OPTICAL SYSTEMS;

EID: 33745600785     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.663017     Document Type: Conference Paper

References (8)

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