MEEF as a matrix

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 980-991

  Granik, Yuri ^a   Cobb, Nick ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Lithography; Mask error enhancement factor; Mask error factor; OPC; Photomask

Indexed keywords

ERROR ANALYSIS; FEATURE EXTRACTION; ITERATIVE METHODS; LIGHTING; MATRIX ALGEBRA; PHOTOLITHOGRAPHY; SILICON WAFERS;

MASK ERROR ENHANCEMENT FACTORS (MEEF);

MASKS;

EID: 0035768096     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458262     Document Type: Conference Paper

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