Preparation and characterizations of PBZr0.53Ti 0.47O3 thick films on LaNiO3 coated si by modified metallorganic decomposition process

Integrated Ferroelectrics

Volumn 80, Issue 1, 2006, Pages 11-20

  Wang, G S ^a,b   Remiens D ^a   Soyer, C ^a   Dogheche, E ^a   Cattan, E ^a  

^a INSTITUT D ELECTRONIQUE   (France)

^b SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

LNO electrode; Metallorganic decomposition process; PZT thick films

Indexed keywords

DECOMPOSITION; FERROELECTRIC DEVICES; LEAD COMPOUNDS; OPTICAL PROPERTIES; ORGANOMETALLICS; PEROVSKITE; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SPIN COATING; X RAY DIFFRACTION ANALYSIS;

INTEGRATED FERROELECTRIC DEVICES; LNO ELECTRODES; METALLORGANIC DECOMPOSITION PROCESS; PZT THICK FILMS;

THICK FILMS;

EID: 33745751541     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580600655645     Document Type: Article

References (20)

1. D. Rémiens, Piezoelectric Materials for Macro/Micro System. Kerala, India: Research Signpost, 2003.
2. T. Haccart, E. Cattan, D. Rémiens, S. Hiboux, and P. Muralt, Appl Phys. Lett. 76, 3292-3294 (2000).
3. W. Gong, J. F. Li, X. C. Chu, Z. L. Gui, and L. T. Li, J. Appl. Phys. 96, 590-595 (2004).
4. X. J. Meng, J. G. Cheng, J. L. Sun, H. J. Ye, S. L. Guo, and J. H. Chu, J. Cryst. Growth. 220, 100-104 (2000).
5. Q. Zou, H. E. Ruda, and B. G. Yacobi, Appl. Phys. Lett. 78, 1282-1284 (2001).
6. M. S. Chen, T. B. Wu, and J. M. Wu, Appl. Phys. Lett. 68, 1430-1432 (1996).
7. G. S. Wang, J. G. Cheng, X. J. Meng, J. Yu, Z. Q. Lai, J. Tang, S. L. Guo, and J. H. Chu, Appl. Phys. Lett. 78, 4172-4174 (2001).
8. S. H. Hu, G. J. Hu, X. J. Meng, G. S. Wang, J. L. Sun, S. L. Guo, J. H. Chu, and N. Dai, J. Cryst. Growth 260, 109-114 (2004).
9. L. Lian and N. R. Sottos, J. Appl. Phys. 87, 3941-3949 (2000).
10. G. J. Hu, S. H. Hu, X. J. Meng, G. S. Wang, Q. Zhao, J. L. Sun, J. H. Chu, N. Dai, L. Xu, L. Y. Liu, and D. X. Li, J. Vac. Sci. Technol. A. 22, 422-424 (2004).
11. S.H. Hu, X.J. Meng, G.S. Wang, J.L. Sun, and D.X. Li, J. Cryst. Growth. 264, 307-311 (2004).
12. R. Seveno, P. Limousin, D. Averty, J.-L. Chartier, R. Bihan L., and H. W. Gunde, J. Euro. Cera. Soci. 20, 2025-2028 (2000).
13. H. D. Chen, K. R. Udayakumar, C. J. Gaskey, and L. E. Cross, J. Am. Ceram. Soc. 79, 2189-2192 (1996).
14. R. Kurchania and S. J. Milne, J. Mater. Res. 14, 1852-1859 (1999).
15. R. A. Dorey and R. W. Whatmore, Integrated Ferroelectrics 50, 111-119 (2002).
16. Z. H. Wang, C. L. Zhao, W. G. Zhu, O. K. Tan, W. G. Liu, and X. Yao, Materials Chemistry and Physics 75, 71-75 (2002).
17. D. L. Xia, M. D. Liu, Y. K. Zeng, R. Ch Li, Materials Science and Engineering B. 87, 160-163 (2001).
18. R. W. Schwarte, J. A. Voigt, B. A. Tuttle, D. A. Payne, T. L. Reichert, and R. S. Dasalla, J. Mater. Res. 12, 444-456 (1997).
19. M. H. Zhao, R. Fu, D. Lu, and T. Y. Zhang, Acta Materialia 50, 4241-4254 (2002).
20. E. Dogheche, D. Remiens, and G. Velu, Vacuum. 66, 1-8 (2002).