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1
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84858909574
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http://www.itrs.net/Common/2005ITRS/Metrologv2005.pdf
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2
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0002575877
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Statistical verification of multiple CD-SEM matching
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Metrology, Inspection, and Process Control for Microlithography XI; Susan K. Jones; Ed., July
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"Statistical verification of multiple CD-SEM matching", Doreen Erickson, Neal T. Sullivan, Richard C. Elliott, Proc. SPIE Vol. 3050. p. 93-100, Metrology, Inspection, and Process Control for Microlithography XI; Susan K. Jones; Ed., July 1997
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(1997)
Proc. SPIE
, vol.3050
, pp. 93-100
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Erickson, D.1
Sullivan, N.T.2
Elliott, R.C.3
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3
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0033716676
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E-beam column monitoring for improved CD SEM stability and tool matching
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Metrology, Inspection, and Process Control for Microlithography XIV; Neal T. Sullivan; Ed., June
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"E-beam column monitoring for improved CD SEM stability and tool matching", Timothy S. Hayes, Randall S. Henninger, Proc. SPIE Vol. 3998. p. 65-72, Metrology, Inspection, and Process Control for Microlithography XIV; Neal T. Sullivan; Ed., June 2000
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(2000)
Proc. SPIE
, vol.3998
, pp. 65-72
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Hayes, T.S.1
Henninger, R.S.2
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4
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0032402673
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Matching analysis on seven manufacturing CD SEMs
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Metrology, Inspection, and Process Control for Microlithography XII; Bhanwar Singh; Ed., June
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"Matching analysis on seven manufacturing CD SEMs", Reginald R. Bowley, Jr., James E. Beecher, Robert M. Cogley, Sandra R. Dupuis, Dewey L. Farrington, Proc. SPIE Vol. 3332. p. 94-99, Metrology, Inspection, and Process Control for Microlithography XII; Bhanwar Singh; Ed., June 1998
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(1998)
Proc. SPIE
, vol.3332
, pp. 94-99
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Bowley Jr., R.R.1
Beecher, J.E.2
Cogley, R.M.3
Dupuis, S.R.4
Farrington, D.L.5
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5
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24644519385
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New comprehensive metrics and methodology for metrology tool fleet matching
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Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May
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"New comprehensive metrics and methodology for metrology tool fleet matching", Eric Solecky, Chas Archie, Bill Banke, Proc. SPIE Vol. 5752. p. 248-258, Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May 2005
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(2005)
Proc. SPIE
, vol.5752
, pp. 248-258
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Solecky, E.1
Archie, C.2
Banke, B.3
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6
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33745631370
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Patent pending: U.S. Patent Application 11/065,740
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Patent pending: U.S. Patent Application 11/065,740
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7
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33745598980
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Patent pending: U.S. Patent Application 11/307,641
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Patent pending: U.S. Patent Application 11/307,641
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8
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0032675468
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Characteristics of accuracy for CD metrology
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Metrology, Inspection, and Process Control for Microlithography XIII; Bhanwar Singh; Ed., June
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"Characteristics of accuracy for CD metrology", G. W. Banke, Jr., Charles N. Archie, Proc. SPIE Vol. 3677. p. 291-308, Metrology, Inspection, and Process Control for Microlithography XIII; Bhanwar Singh; Ed., June 1999
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(1999)
Proc. SPIE
, vol.3677
, pp. 291-308
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Banke Jr., G.W.1
Archie, C.N.2
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9
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4344674992
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Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology
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Metrology, Inspection, and Process Control for Microlithography XVIII; Richard M. Silver; Ed., May
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"Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology". Bill Banke, Jr., Charles N. Archie, Matthew Sendelbach, Jim Robert, James A. Slinkman, Phil Kaszuba, Rick Kontra, Mick DeVries, Eric P. Solecky, Proc. SPIE Vol. 5375. p. 133-150, Metrology, Inspection, and Process Control for Microlithography XVIII; Richard M. Silver; Ed., May 2004
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(2004)
Proc. SPIE
, vol.5375
, pp. 133-150
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Banke Jr., B.1
Archie, C.N.2
Sendelbach, M.3
Robert, J.4
Slinkman, J.A.5
Kaszuba, P.6
Kontra, R.7
DeVries, M.8
Solecky, E.P.9
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10
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0141835067
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Scatterometry measurement precision and accuracy below 70 nm
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Metrology, Inspection, and Process Control for Microlithography XVII; Daniel J. Herr; Ed., June
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"Scatterometry measurement precision and accuracy below 70 nm", Matthew Sendelbach, Charles N. Archie, Proc. SPIE Vol. 5038. p. 224-238, Metrology, Inspection, and Process Control for Microlithography XVII; Daniel J. Herr; Ed., June 2003
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(2003)
Proc. SPIE
, vol.5038
, pp. 224-238
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Sendelbach, M.1
Archie, C.N.2
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11
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23244442960
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Comparison of scatterometry, atomic force microscope, dual beam system, and XSEM to measure etched via depths
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Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May
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"Comparison of scatterometry, atomic force microscope, dual beam system, and XSEM to measure etched via depths", Matthew Sendelbach, Dmitriy Shneyder, Wei Lu, Kevin Boyd, Proc. SPIE Vol. 5752, p. 272-287, Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May 2005
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(2005)
Proc. SPIE
, vol.5752
, pp. 272-287
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Sendelbach, M.1
Shneyder, D.2
Lu, W.3
Boyd, K.4
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12
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24644485285
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Design-based metrology: Advanced automation for CD-SEM recipe generation
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Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May
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"Design-based metrology: advanced automation for CD-SEM recipe generation", C. Tabery, L. Capodieci, C. Haidinyak, K. Shah, M. Threefoot, B. Choo, B. Singh, Y. Nehmadi, C. Ofek, O. Menadeva, A. Ben-Porath, Proc. SPIE Vol. 5752. p. 527-535, Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May 2005
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(2005)
Proc. SPIE
, vol.5752
, pp. 527-535
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Tabery, C.1
Capodieci, L.2
Haidinyak, C.3
Shah, K.4
Threefoot, M.5
Choo, B.6
Singh, B.7
Nehmadi, Y.8
Ofek, C.9
Menadeva, O.10
Ben-Porath, A.11
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13
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24644490593
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A new matching engine between design layout and SEM image of semiconductor device
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Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May
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"A new matching engine between design layout and SEM image of semiconductor device", Hidetoshi Morokuma, Akiyuki Sugiyama, Yasutaka Toyoda, Wataru Nagatomo, Takumichi Sutani, Ryoichi Matsuoka, Proc. SPIE Vol. 5752. p. 546-558, Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May 2005
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(2005)
Proc. SPIE
, vol.5752
, pp. 546-558
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Morokuma, H.1
Sugiyama, A.2
Toyoda, Y.3
Nagatomo, W.4
Sutani, T.5
Matsuoka, R.6
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14
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24644448785
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Use of design pattern layout for automatic metrology recipe generation
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Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May
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"Use of design pattern layout for automatic metrology recipe generation", Cyrus Tabery, Lorena Page, Proc. SPIE Vol. 5752. p; 1424-1434, Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May 2005
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(2005)
Proc. SPIE
, vol.5752
, pp. 1424-1434
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Tabery, C.1
Page, L.2
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15
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24644432976
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Evaluation of Hitachi CAD to CD-SEM metrology package for OPC model tuning and product devices OPC verification
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Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May
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"Evaluation of Hitachi CAD to CD-SEM metrology package for OPC model tuning and product devices OPC verification", Pietro Cantu, Gianfranco Capetti, Chiara Catarisano, Fabrizio D'Angelo, Elena Evangelista, Ermes Severgnini, Silvia Trovati, Mauro Vasconi, Takumichi Sutani, Stephan Wahl, Robert StEffen, Proc. SPIE Vol. 5752. p. 1341-1352, Metrology, Inspection, and Process Control for Microlithography XIX; Richard M. Silver; Ed., May 2005
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(2005)
Proc. SPIE
, vol.5752
, pp. 1341-1352
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Cantu, P.1
Capetti, G.2
Catarisano, C.3
D'Angelo, F.4
Evangelista, E.5
Severgnini, E.6
Trovati, S.7
Vasconi, M.8
Sutani, T.9
Wahl, S.10
StEffen, R.11
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16
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33745600013
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Patent pending: U.S. Patent Application 11/160,404
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Patent pending: U.S. Patent Application 11/160,404
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