A new matching engine between design layout and SEM image of semiconductor device

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 546-558

  Morokuma, Hidetoshi ^a   Sugiyama, Akiyuki ^a   Toyoda, Yasutaka ^b   Nagatomo, Wataru ^b   Sutani, Takumichi ^a   Matsuoka, Ryoichi ^a  

^a HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

CD SEM; Design; Image processing; Layout; OPC; Pattern matching; SEM

Indexed keywords

ERROR ANALYSIS; IMAGE PROCESSING; LITHOGRAPHY; MEASUREMENT THEORY; SEMICONDUCTOR DEVICES;

DESIGN LAYOUT; EDGE PLACEMENT ERRORS (EPE); OPTICAL PROXIMITY CORRECTION (OPC); OPTICAL RESOLUTION;

SCANNING ELECTRON MICROSCOPY;

EID: 24644490593     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602066     Document Type: Conference Paper

References (4)

1. C. A. Haidinyak, C. E. Tabery, et al: "Experiments with contact SEM images", Proceedings of Photomask 5567-79, 2004
2. H. Yang, et al: "OPC Accuracy and Process Window Verification Methodology for sub-100nm Node", Proceedings of SPIE Volume5375, 2004
3. G. J. Vanderbrug, "Semi linear line detectors", Computer Graphics and Image Processing, Vol. 4, pp. 287-293, 1975.
4. Kasvand, T, A new family of nonlinear edge detectors for noisy images: Proc SPIE, Vol.435, pp. 10-16, 1983.