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Volumn 5752, Issue I, 2005, Pages 248-258

New comprehensive metrics and methodology for metrology tool fleet matching

Author keywords

BMS; CD SEM; FMP; Matching; PSA; TMP; TuT

Indexed keywords

BMS; CD SEM; FMP; MATCHING; PSA; TMP; TUT;

EID: 24644519385     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602330     Document Type: Conference Paper
Times cited : (22)

References (5)
  • 1
    • 4344584767 scopus 로고    scopus 로고
    • The estimation of total measurement uncertainty in a multiple metrology tool environment
    • Metrology, Inspection, and Process Control for Microlithography XVIII; Richard M. Silver; Ed., May
    • "The estimation of total measurement uncertainty in a multiple metrology tool environment", Justin J. Hwu, Thao J. Pham, Sukhbir Dulay, Andrew Lopez, Peter Wilkens, Proc. SPIE Vol. 5375. p. 413-425, Metrology, Inspection, and Process Control for Microlithography XVIII; Richard M. Silver; Ed., May 2004
    • (2004) Proc. SPIE , vol.5375 , pp. 413-425
    • Hwu, J.J.1    Pham, T.J.2    Dulay, S.3    Lopez, A.4    Wilkens, P.5
  • 2
    • 0032651647 scopus 로고    scopus 로고
    • Multiple CD-SEM matching for 0.18-μm lines/spaces at different exposure conditions
    • Metrology, Inspection, and Process Control for Microlithography XIII; Bhanwar Singh; Ed. June
    • "Multiple CD-SEM matching for 0.18-μm lines/spaces at different exposure conditions", Andre Engelen, Ingrid Minnaert-Janssen, Proc. SPIE Vol. 3677, p. 280-290, Metrology, Inspection, and Process Control for Microlithography XIII; Bhanwar Singh; Ed. June 1999
    • (1999) Proc. SPIE , vol.3677 , pp. 280-290
    • Engelen, A.1    Minnaert-Janssen, I.2
  • 4
    • 0032675468 scopus 로고    scopus 로고
    • Characteristics of accuracy for CD metrology
    • Metrology, Inspection, and Process Control for Microlithography XIII; Bhanwar Singh; Ed. June
    • "Characteristics of Accuracy for CD Metrology", G. W. Banke, Jr., Charles N. Archie, Proc. SPIE Vol. 3677, p. 291-308, Metrology, Inspection, and Process Control for Microlithography XIII; Bhanwar Singh; Ed. June 1999
    • (1999) Proc. SPIE , vol.3677 , pp. 291-308
    • Banke Jr., G.W.1    Archie, C.N.2
  • 5
    • 0141500247 scopus 로고    scopus 로고
    • Characterizing and understanding stray tilt: The next major contributor to CD SEM tool matching
    • Metrology, Inspection, and Process Control for Microlithography XVII; Daniel J. Herr; Ed., June
    • "Characterizing and understanding stray tilt: the next major contributor to CD SEM tool matching", Eric P. Solecky, Charles N. Archie, Jason Mayer, Roger S. Cornell, Ofer Adan, Proc. SPIE Vol. 5038, p. 518-527, Metrology, Inspection, and Process Control for Microlithography XVII; Daniel J. Herr; Ed., June 2003
    • (2003) Proc. SPIE , vol.5038 , pp. 518-527
    • Solecky, E.P.1    Archie, C.N.2    Mayer, J.3    Cornell, R.S.4    Adan, O.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.