Matching analysis on seven manufacturing CDSEMs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 94-99

  Bowley Jr , Reginald R ^a   Beecher, James E ^a   Cogley, Robert M ^a   Dupuis, Sandra R ^a   Farrington, Dewey L ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

ANOVA; CDSEM; Matching; Metrology; Process control; Statistical

Indexed keywords

ELECTRON BEAMS; IMAGE ANALYSIS; OPTICAL VARIABLES MEASUREMENT; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

ANALYSIS-OF-VARIANCE (ANOVA); MATCHING ANALYSIS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032402673     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308719     Document Type: Conference Paper

References (6)

1. Statistical verification of multiple CD SEM matching