Atomic oxygen surface loss probability on silica in microwave plasmas studied by a pulsed induced fluorescence technique

Plasma Sources Science and Technology

Volumn 15, Issue 3, 2006, Pages 479-488

  Cartry, Gilles ^a,d   Duten, Xavier ^b   Rousseau, Antoine ^c  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b UNIVERSITÉ PARIS 13   (France)

^c ECOLE POLYTECHNIQUE   (France)

^d AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORESCENCE; MICROWAVES; OXYGEN; PROBABILITY; SILICA;

ATOMIC OXYGEN; MICROWAVE PLASMAS; PULSED INDUCED FLUORESCENCE; SURFACE LOSS PROBABILITY;

PLASMAS;

EID: 33745608497     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/3/025     Document Type: Article

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