메뉴 건너뛰기




Volumn 211, Issue 1-4, 2003, Pages 96-101

Heterogeneous recombination of neutral oxygen atoms on niobium surface

Author keywords

Adatoms; Niobium; Oxygen; Plasma processing

Indexed keywords

ELECTRIC DISCHARGES; IONIZATION; NIOBIUM; OXYGEN; PLASMA DEVICES; POLYCRYSTALLINE MATERIALS;

EID: 0037540064     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00202-2     Document Type: Article
Times cited : (11)

References (34)
  • 8
    • 0003501942 scopus 로고    scopus 로고
    • Societe Francaise du Vide, Paris
    • A. Ricard, Reactive Plasmas, Societe Francaise du Vide, Paris, 1996.
    • (1996) Reactive Plasmas
    • Ricard, A.1
  • 10
    • 0003325329 scopus 로고    scopus 로고
    • Plasma sources for polymer surface treatment
    • S.I. Shah (Ed.), Institute of Physics Publishing, Bristol
    • M.R. Wertheimer, L. Marinu, E.M. Liston, Plasma sources for polymer surface treatment, in: S.I. Shah (Ed.), Handbook of Thin Film Process Technology, Institute of Physics Publishing, Bristol, 1998.
    • (1998) Handbook of Thin Film Process Technology
    • Wertheimer, M.R.1    Marinu, L.2    Liston, E.M.3
  • 14
    • 0038206367 scopus 로고    scopus 로고
    • Ricard A. Vide. 57:2002;1.
    • (2002) Vide , vol.57 , pp. 1
    • Ricard, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.