Effects of various oxidizers on chemical mechanical polishing performance of nickel for microelectromechanical system applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1297-1301

  Kim, Nam Hoon ^a   Choi, Gwon Woo ^a   Seo, Yong Jin ^b   Lee, Woo Sun ^a  

^a Chosun University   (South Korea)

^b Daebul University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHEMICAL MECHANICAL POLISHING; HYDROGEN PEROXIDE; NICKEL ALLOYS; OXIDATION; POLARIZATION; SLURRIES; SURFACE TOPOGRAPHY;

H2 O2 CONCENTRATION; OXIDIZERS; POTENTIODYNAMIC POLARIZATION;

MICROELECTROMECHANICAL DEVICES;

EID: 33745487205     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2194926     Document Type: Article

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