Chemical mechanical planarization characteristics of WO3 thin film for gas sensing

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 737-740

  Seo, Yong Jin ^a   Kim, Nam Hoon ^b   Chang, Eui Goo ^c   Park, Jinseong ^b   Ko, Pil Ju ^b   Lee, Woo Sun ^b  

^a Daebul University   (South Korea)

^b Chosun University   (South Korea)

^c Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL MECHANICAL POLISHING; CHEMICAL SENSORS; MICROSTRUCTURE; MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS;

OXIDIZERS; THIN FILM TOPOGRAPHIES; TUNGSTEN SLURRIES;

TUNGSTEN COMPOUNDS;

EID: 31044437794     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1868612     Document Type: Conference Paper

References (11)

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