Development of a low temperature MEMS process with a PECVD amorphous silicon structural layer

Journal of Micromechanics and Microengineering

Volumn 16, Issue 7, 2006, Pages 1307-1313

  Chang, Stella ^a   Sivoththaman, Siva ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; ALUMINUM; AMORPHOUS SILICON; FABRICATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; STRESS ANALYSIS;

BIMORPH THERMAL ACTUATORS; MECHANICAL SIMULATIONS; METAL-OXIDE-SEMICONDUCTOR TECHNOLOGY; STRUCTURAL LAYERS;

MICROELECTROMECHANICAL DEVICES;

EID: 33745110928     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/16/7/027     Document Type: Article

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