Control of preferred orientation for ZnOx films: control of self-texture

Journal of Crystal Growth

Volumn 130, Issue 1-2, 1993, Pages 269-279

  Fujimura, Norifumi ^a   Nishihara, Tokihiro ^a   Goto, Seiki ^a   Xu, Jifang ^a   Ito, Taichiro ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL GROWTH; CRYSTAL LATTICES; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; GLASS; SPUTTERING; TEXTURES; THIN FILMS; ZINC OXIDE;

PREFERRED ORIENTATION CONTROL; RADIO FREQUENCY MAGNETRON SPUTTERING; SELF TEXTURE CONTROL; ZINC OXIDE FILMS;

SEMICONDUCTING FILMS;

EID: 0027593101     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(93)90861-P     Document Type: Article

References (16)

1. Summary Abstract: Fabrication of ultrathin heterostructures with van der Waals epitaxy
2. The Growth of Crystals and the Equilibrium Structure of their Surfaces
3. Crystallographic Orientation of Zinc Oxide Films Deposited by Triode Sputtering