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Volumn 42, Issue 3, 2003, Pages 1441-1444

Etching characteristics of organic polymers in the magnetic neutral loop discharge plasma

Author keywords

Deep etching; Low k; N2 + H2 plasma; NLD plasma; Organic polymer

Indexed keywords

ANISOTROPY; CHEMICAL BONDS; GASES; POLYIMIDES; SCANNING ELECTRON MICROSCOPY; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0038290602     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.1441     Document Type: Article
Times cited : (16)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.