In vacuo electron-spin-resonance study on amorphous fluorinated carbon films for understanding of surface chemical reactions in plasma etching

Applied Physics Letters

Volumn 81, Issue 10, 2002, Pages 1773-1775

  Ishikawa, Kenji ^a   Kobayashi, Shoji ^a   Okigawa, Mitsuru ^a   Sekine, Makoto ^a   Yamasaki, Satoshi ^b   Yasuda, Tetsuji ^b   Isoya, Jun Ichi ^c  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

A-C:F FILMS; CHARACTERISTIC PROPERTIES; ESR SPECTRA; FLUORINATED CARBON FILMS; FLUORINE ATOMS; HYPERFINE INTERACTIONS; IN-VACUUM; OXYGEN MOLECULE; ROOM TEMPERATURE; SI DANGLING BONDS; SURFACE CHEMICAL REACTIONS;

AMORPHOUS CARBON; AMORPHOUS FILMS; ATOMIC SPECTROSCOPY; CARBON FILMS; CHEMICAL REACTIVITY; DANGLING BONDS; FLUORINE; OXYGEN; PLASMA ETCHING; SILICON COMPOUNDS; SURFACE REACTIONS;

ELECTRON SPIN RESONANCE SPECTROSCOPY;

EID: 79956002804     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1505121     Document Type: Article

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