Molecular-dynamics simulations of organic polymer etching by hydrocarbon beams

Journal of Applied Physics

Volumn 96, Issue 11, 2004, Pages 6147-6152

  Yamada, Hideaki ^a   Hamaguchi, Satoshi ^a  

^a Kyoto Org University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL BONDS; COMPUTER SIMULATION; ETCHING; MOLECULAR DYNAMICS; PERMITTIVITY; PLASMAS; VAN DER WAALS FORCES;

CARBON BONDS; HYDROGEN-NITROGEN PLASMAS; INJECTION ENERGY; MOLECULAR DYNAMICS SIMULATION;

ORGANIC POLYMERS;

EID: 18844448891     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1808907     Document Type: Article

References (23)

1. M. Terrones, Appl. Phys. A: Mater. Sci. Process. 74, 355 (2002).
2. S. Bhattacharyya, Appl. Phys. Lett. 79, 1441 (2001).
3. H. Nagai, S. Takashima, M. Hiramatsu, M. Hori, and T. Goto, J. Appl. Phys. 91, 2615 (2002).
4. M. Fukasawa, T. Hasegawa, S. Hirano, and S. Kadomura, In Proceedings of Symposium on Dry Process (The Institute of Electrical Engineers of Japan, Tokyo, 1998), p. 175.
5. H. Nagai, M. Hiramatsu, M. Hori, and T. Goto, Jpn. J. Appl. Phys., Part 1 42, 212 (2003).
6. H. Nagai, M. Hiramatsu, M. Hori, and T. Goto, J. Appl. Phys. 94, 1362 (2003).
7. Y. Morikawa, T. Hayashi, and T. Uchida, Jpn. J. Appl. Phys., Part 1 42, 1441 (2003).
8. A. Oki, Jpn. J. Appl. Phys., Part 1 42, 3722 (2003).
9. Y. Zaho, F. Wang, Z. C. Cui, J. Zheng, H. M. Zhang, D. M. Zhang, S. Y. Liu, and M. B. Yi, Microelectron. J. 35, 605 (2004).
10. D. W. Brenner, Phys. Rev. B 42, 9458 (1990).
11. S. B. Sinnott, A. Shenderova, C. T. Whiter, and D. W. Brenner, Carbon 36, 1 (1998).
12. I. Jang, B. Ni, and S. B. Sinnott, J. Vac. Sci. Technol. A 20, 564 (2002).
13. I. Jang, R. Phillips, and S. B. Sinnott, J. Appl. Phys. 92, 3363 (2002).
14. M. B. J. Wijesundara, Y. I. B. Ni, S. B. Sinnott, and L. Hanley, J. Appl. Phys. 88, 5004 (2000).
15. P. Pradere and A. Boudet, J. Mater. Sci. 22, 4240 (1987).
16. J. Roth, J. Number Theory 266-269, 51 (1991).
17. C. Hopf, A. Von Keudell, and W. Jacob, J. Appl. Phys. 94, 2373 (2003).
18. E. Salonen, K. Nordlund, and J. Keinonen, Phys. Rev. B 63, 195415 (2001).
19. S. J. Stuart, A. B. Tutein, and J. A. Harrison, J. Chem. Phys. 112, 6472 (2000).
20. R. Smith and K. Beardmore, Thin Solid Films 272, 255 (1996).
21. L. A. Girifalco, J. Phys. Chem. 96, 858 (1992).
22. S. S. Jang, T. Cagin, and W. A. Goddard, III J. Chem. Phys. 119, 1843 (2003).
23. H. Yamada and S. Hamaguchi, in Proceedings of Internal Symposium on Dry Process (The Institute of Electrical Engineers of Japan, Tokyo, 2002), P. 189.