Study of organic polymer thin-film etching by plasma beam irradiation

Journal of Applied Physics

Volumn 98, Issue 8, 2005, Pages

  Kurihara, Kazuaki ^a   Egami, Akihiro ^b   Nakamura, Moritaka ^b  

^a TOSHIBA CORPORATION   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ION ENERGY; METHACRYLATE POLYMER FILMS; PHYSICAL SPUTTERING; PLASMA BEAM IRRADIATION;

BEAM PLASMA INTERACTIONS; IRRADIATION; PLASMAS; POLYMERS; SPUTTERING; THIN FILMS;

ETCHING;

EID: 27744571726     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2113410     Document Type: Article

References (7)

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7. K. Kurihara, A. Egami, and M. Nakamura, (unpublished).