Continuous tone gray-scale photomask for deep UV lithography applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 1059-1064

  Mendoza, E A ^a   Sigoli, F ^a   Paulus, H ^a   Giang, L Q ^a   Seifouri, M ^a   Lam, E ^a   Kempen, L ^a  

^a OptiNetrics Inc   (United States)

Author keywords

Attenuated photomask; Continuous tone; Gradient refractive index; Gray scale; Phase shift mask

Indexed keywords

ATTENUATED PHOTOMASKS; GRADIENT REFRACTIVE INDEX; GRAY SCALES; PHASE-SHIFT MASKS;

APPROXIMATION THEORY; COST EFFECTIVENESS; ELECTRIC GENERATORS; ETCHING; HOLOGRAMS; LASER APPLICATIONS; MASKS; MICROPROCESSOR CHIPS; OPTIMIZATION; REFRACTIVE INDEX; SEMICONDUCTOR DEVICES; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 3843073019     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.527581     Document Type: Conference Paper

References (2)

1. Suleski, T. J., et.al., "Gray Scale Masks for Diffractive Optics Applications: I. Commercial Slide Imagers," Appl. Optics, 34, pp.7507-7517, (1995)
2. Daschner, W., et.al., "One Step Lithography for Mass Production of Multilevel Diffractive Optical Elements Using High Energy Bean Sensitive (HEBS) Gray-Level Mask," SPIE Proc., 2689, 153-157, (1996)