Electrical, optical, and structural characteristics of ITO thin films by krypton and oxygen dual ion-beam assisted evaporation at room temperature

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 115-121

  Kim, H J ^a   Bae, J W ^a   Kim, J S ^a   Kim, K S ^a   Jang, Y C ^a   Yeom, G Y ^a   Lee, N E ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; EVAPORATION; GLASS; INDIUM COMPOUNDS; ION BEAMS; KRYPTON; OXYGEN; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DUAL ION-BEAM EVAPORATIONS;

CONDUCTIVE FILMS;

EID: 0034515516     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01421-8     Document Type: Article

References (19)

1. Kim H., Dique A., Horwitz J.S., Chrisey D.B. Appl. Phys. Lett. 74:(23):1999;3444.
2. Hiramatsu H., Seo W.S., Koumoto K. Chem. Mater. 10:1998;3033.
3. R.B.H. Tahar, Takayuki, Y. Takahashi, J. Appl. Phys. 83 (5) (1998) 2631.
4. Kim H., Gilmore C.M. J. Appl. Phys. 86:(11):1999;6451.
5. Wu Y., Maree C.H.M., Feldman L.C. J. Appl. Phys. 86:(2):1999;991.
6. Wu W.F., Chiou B.S. Thin Solid Films. 247:1994;201.
7. Salehi A. Thin Solid Films. 324:1998;214.
8. Dobrowolski J.A., Ho F.C., Waldorf A. Appl. Opt. 26:(24):1987;5204.
9. Gilo M., Dahan R. Opt. Eng. 26:(6):1999;953.
10. Sikola T., Spousta J., Dub P. Surf. Coat. Technol. 84:1996;485.
11. Laux S., Kaiser N., Zoller A. Thin Solid Films. 335:1998;1.
12. Bae J.W., Kim H.J., Kim J.S., Lee N.-E., Yeom G.Y. Vacuum. 56:2000;77.
13. Paine D.C., Whitson T., Yang C.O. J. Appl. Phys. 85:(12):1999;8445.
14. Kulkarni A.K., Lim T. J. Vac. Sci. Technol., A. 16:(3):1998;1636.
15. Kao A.S., Gorman G.L. J. Appl. Phys. 67:(8):1990;3826.
16. Nastasi M., Mayer J.W., Hirvonen J.K. Ion-Solid Interaction. 1996;295 Cambridge University Press.
17. Hartnagel H.L. Semiconducting Transparent Thin Films. 1995;185 Institute of Physics Publishing, Bristol and Philadelphia.
18. Wu W.F., Chiou B.S. Thin Solid Films. 298:1997;221.
19. Meng L.J., Macarico A., Martins R. Vacuum. 46:(7):1995;673.