Fabrication of a-Si1-xCx:H thin films for solar cells by the Cat-CVD method using a carbon catalyzer

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 170-173

  Sugita, Ken ^a   Itoh, Masaya ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Carbon catalyzer; Catalytic chemical vapor deposition (Cat CVD); Silicon carbide

Indexed keywords

AMORPHOUS SILICON; CARBON; CHEMICAL VAPOR DEPOSITION; HYDROGENATION; SOLAR CELLS;

CARBON CATALYZERS;

THIN FILMS;

EID: 0038485872     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00102-0     Document Type: Conference Paper

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