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Volumn 102, Issue 1, 1998, Pages 73-78

A high temperature study of the reaction SiH4+H ⇄ SiH3+H2

Author keywords

Chemicals Kinetics; Radicals; Shock Waves

Indexed keywords


EID: 0002343186     PISSN: 0940483X     EISSN: None     Source Type: Journal    
DOI: 10.1002/bbpc.19981020109     Document Type: Article
Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.