Influence of different carbon source gases on preparation and properties of a-Si1-XCX:H alloy films including μc-Si:H by hot-wire CVD

Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 2, 2002, Pages 880-884

  Itoh, T ^a   Fujiwara, T ^a   Katoh, Y ^a   Fukunaga, K ^a   Nonomura, S ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CARBON; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HYDROGENATION;

ALLOY FILMS;

SEMICONDUCTING FILMS;

EID: 17444446778     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(01)01115-2     Document Type: Article

References (8)