Epitaxy and bonding of Cu films on oxygen-terminated α-Al2O3(0 0 0 1) surfaces

Acta Materialia

Volumn 54, Issue 10, 2006, Pages 2685-2696

  Oh, Sang Ho ^a,b   Scheu, Christina ^a,c   Wagner, Thomas ^a,d   Tchernychova, Elena ^a,e   Rühle, Manfred ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b Erich Schmid Institute of Materials Science   (Austria)

^c UNIVERSITY OF LEOBEN   (Austria)

^d MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

^e GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Copper; Crystalline oxides; Interface structure; Molecular beam epitaxy; Transmission electron microscopy

Indexed keywords

CHEMICAL BONDS; MOLECULAR BEAM EPITAXY; OXYGEN; SURFACE CHEMISTRY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTALLINE OXIDES; INTERFACE STRUCTURE; OXYGEN PLASMA CLEANING;

COPPER;

EID: 33646512420     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2006.02.011     Document Type: Article

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