Morphology and microstructure of the Ar+-ion sputtered (0001) α-Al2O3 surface

Applied Surface Science

Volumn 165, Issue 2, 2000, Pages 159-165

  Akatsu, Takeshi ^a,b   Scheu, Christina ^c   Wagner, Thomas ^c   Gemming, Thomas ^c   Hosoda, Naoe ^a   Suga, Tadatomo ^a   Rühle, Manfred ^c  

^a UNIVERSITY OF TOKYO   (Japan)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; ION BOMBARDMENT; MORPHOLOGY; SPUTTERING; SUBSTRATES; SURFACE CHEMISTRY; SURFACE TREATMENT; TRANSMISSION ELECTRON MICROSCOPY;

ANALYTICAL ELECTRON MICROSCOPY;

ALUMINA;

EID: 0034275426     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00376-7     Document Type: Article

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