Study of ultra-thin hydrogen silsesquioxane films using X-ray reflectivity

Thin Solid Films

Volumn 312, Issue 1-2, 1998, Pages 73-77

  Wu, Wen Li ^a   Liou, Huey Chiang ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b DOW CHEMICAL COMPANY   (United States)

Author keywords

CTE; Fox ; Hydrogen silsesquioxane; Low dielectric; X ray reflectivity

Indexed keywords

AROMATIC COMPOUNDS; SILICON WAFERS; SUBSTRATES; THERMAL EXPANSION; THICKNESS MEASUREMENT; ULTRATHIN FILMS;

HYDROGEN SILSESQUIOXANE; THERMAL EXPANSION COEFFICIENT; X RAY REFLECTIVITY;

DIELECTRIC FILMS;

EID: 0031674091     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00587-7     Document Type: Article

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